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Regular axiconswill createannularly shaped beam
the pulse shape(passive) is strongly influenced byビーム形状はパルス形状に強く影響される 。 Beam shape
radiosurgery technology(passive) was ... designedShaped - beam
to be an arbitrary shape such as a rectangular shape , a linear shape , or an elliptical shape(passive) can be setA beam shape
the last collimator opening in the x - ray path(passive) is ... set bybeam shape
Again , set up in the previously described way , it stretched out my verticesto createa beam shape
controlling the phase of each module(passive) is createdBeam shape
a spring mass system on the base(passive) composed bya beam shape
adaptive optics ... rasteringto createa beam shape
aberration(passive) caused bybeam shape
an electronically steered phased array(passive) created bya beam shape
collimators 160 , etc(passive) created bybeam shape
for a long throw with minimal sidespill(passive) is designedBeam shape
device and illuminating area setting deviceUS6445442 * Aug 20 , 2001Sep 3settingdevice and illuminating area setting deviceUS6445442 * Aug 20 , 2001Sep 3
device and illuminating area setting devicesettingdevice and illuminating area setting device
device and illuminating area setting deviceUS6404499settingdevice and illuminating area setting deviceUS6404499
device and illuminating area setting deviceUS6812999settingdevice and illuminating area setting deviceUS6812999
device and illuminating area setting deviceUS6452661Feb 26 , 1999Sep 17 , 2002Nikon CorporationIllumination system and exposure apparatus and methodUS20020186811settingdevice and illuminating area setting deviceUS6452661Feb 26 , 1999Sep 17 , 2002Nikon CorporationIllumination system and exposure apparatus and methodUS20020186811
device and illuminating area setting deviceUS6366341Aug 10 , 2000Apr 2 , 2002Nikon CorporationExposure method and exposure apparatusUS6404499Apr 16 , 1999Jun 11settingdevice and illuminating area setting deviceUS6366341Aug 10 , 2000Apr 2 , 2002Nikon CorporationExposure method and exposure apparatusUS6404499Apr 16 , 1999Jun 11
for Cyclists riding in urban environmentsSpecially designedfor Cyclists riding in urban environments
and analyzed using the non - standard beam optioncan be designedand analyzed using the non - standard beam option
from transmissionresultingfrom transmission
from a wave propagation analysis of the invention , including gain saturation of an RF excited CO.sub.2 --N.sub.2resultfrom a wave propagation analysis of the invention , including gain saturation of an RF excited CO.sub.2 --N.sub.2
a virtual sheet of lightto createa virtual sheet of light
from a wave propagation analysis of the invention , including gain saturation of an RF excited CO2 --N2 --He mixtureresultfrom a wave propagation analysis of the invention , including gain saturation of an RF excited CO2 --N2 --He mixture
severe random spike structure in the spillcausingsevere random spike structure in the spill
diffraction(passive) caused bydiffraction
for a long throw with minimal side spillis designedfor a long throw with minimal side spill
alsoinfluencesalso
for short - range application IP67 and IP69 KDesignedfor short - range application IP67 and IP69 K
for short - range application ✔ Built for tough environmentsDesignedfor short - range application ✔ Built for tough environments